Probe of the vicinal Si (111) surface by second harmonic phase spectroscopy

Schuhmacher, D.D.SchuhmacherMarowsky, GerdGerdMarowskyFedyanin, A. A.A. A.FedyaninDolgova, T. V.T. V.DolgovaAktsipetrov, O. A.O. A.Aktsipetrov2018-11-072018-11-072001https://resolver.sub.uni-goettingen.de/purl?gro-2/30032The intrinsic surface sensitive technique of optical second harmonic (SH) phase and intensity measurements is used to probe a slightly miscut natively oxidized Si(1 1 1) surface. The experiments have been performed in a spectral interval covering the E-2 resonance of silicon band structure. The phase and intensity of the SH wave measured at several azimuthal angular positions allow to separate the vicinal contributions. (C) 2001 Elsevier Science Ltd. All rights reserved.Probe of the vicinal Si (111) surface by second harmonic phase spectroscopyconference_paper10.1016/S1369-8001(00)00112-8000167727200013