Nanofabrication of spin-transfer torque devices by a polymethylmethacrylate mask one step process: Giant magnetoresistance versus single layer devices

Parge, AnneAnnePargeNiermann, ToreToreNiermannSeibt, MichaelMichaelSeibtMuenzenberg, Markus G.Markus G.Muenzenberg2018-11-072018-11-072007https://resolver.sub.uni-goettingen.de/purl?gro-2/51370We present a method to prepare magnetic spin torque devices of low specific resistance in a one step lithography process. The quality of the pillar devices is demonstrated for a standard magnetic double layer device. For single layer devices, we found hysteretic switching and a more complex dynamical excitation pattern in higher fields. A simple model to explain the resistance spikes is presented. (c) 2007 American Institute of Physics.Nanofabrication of spin-transfer torque devices by a polymethylmethacrylate mask one step process: Giant magnetoresistance versus single layer devicesjournal_article10.1063/1.2717544000246891500123