Publication:
Large-Area Laser-Lift-Off Processing in Microelectronics

dc.bibliographiccitation.firstpage241
dc.bibliographiccitation.journalPhysics Procedia
dc.bibliographiccitation.lastpage248
dc.bibliographiccitation.volume41
dc.contributor.authorDelmdahl, R.
dc.contributor.authorPätzel, R.
dc.contributor.authorBrune, J.
dc.date.accessioned2019-07-09T11:40:48Z
dc.date.available2019-07-09T11:40:48Z
dc.date.issued2013
dc.description.abstractLaser lift-off is an enabling technology for microelectronics growth markets such as light emitting diodes, densely packaged semiconductor devices, and flexible displays. For example, thin film transistor structures fabricated on top of polymer layers spun on glass carriers must be delaminated from rigid substrates to create lightweight and rugged flexible displays on polymers. Low-thermal-budget processes are generically required to protect adjacent functional films. Excimer lasers provide short UV wavelength and short pulse duration required for highly-localized energy coupling. The high output power of excimer lasers enables a large processing footprint and the high-throughput rates needed in mass manufacturing.
dc.identifier.doi10.1016/j.phpro.2013.03.075
dc.identifier.purlhttps://resolver.sub.uni-goettingen.de/purl?gs-1/11343
dc.identifier.urihttps://resolver.sub.uni-goettingen.de/purl?gro-2/58253
dc.item.fulltextWith Fulltext
dc.language.isoen
dc.notes.internMerged from goescholar
dc.rightsCC BY-NC-ND 3.0
dc.rights.urihttps://creativecommons.org/licenses/by-nc-nd/3.0
dc.titleLarge-Area Laser-Lift-Off Processing in Microelectronics
dc.typejournal_article
dc.type.internalPublicationyes
dc.type.versionpublished_version
dspace.entity.typePublication

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